Atomically Thin Oxides for Ultralow Power Non-volatile Memory Technology

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Title
Atomically Thin Oxides for Ultralow Power Non-volatile Memory Technology

CoPED ID
f18f4319-a21e-4025-bcd0-dabadd987065

Status
Active

Funder

Value
No funds listed.

Start Date
Sept. 30, 2021

End Date
Sept. 29, 2025

Description

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New high-performance, ultralow power non-volatile memory (NVM) technology is essential to a wide range of diverse and hugely growing data centric technologies spanning IoT, transport, medicine, security, entertainment, neuromorphic computing, and AI, all which will evolve significantly over the next decade, and in time will radically change the way we live. NVM is also essential for strongly improving the efficiency of energy-hungry data centres where memory accounts for a large fraction of the overall power usage. Memristors can mimic artificial neurons capable of both computing and storing data, and they have the potential to dramatically reduce the energy and time lost in conventional computers. Within the memristor structure itself, certain oxides (inc. TiO2 and HfO2) are excellent active layers, owing in part to labile oxygen vacancies affecting the resistance of the layer, upon an applied voltage. This project shall explore and focus on precisely engineered two-dimensional (2D) oxide materials to develop novel active 'switching' layers in memristors. This offers exciting potential for the following reasons: Firstly, we can downscale the overall design, making it more compact and avoid the 'short channel' effect, by confining electrons within the atomically-thin active region. Secondly, we can test novel van der Waals bound active layers where there could be new phenomena giving rise to enhanced switching. Lastly, the large range of available layered materials provides scope to explore a wealth of potential combinations as a multi-layered active layer. Guided first by a material down-selection process, we shall fabricate devices and characterise them using state-of-the-art facilities, all the while considering future potential use cases, with a special emphasis on neural network/machine learning applications.

Judith Driscoll SUPER_PER
Benedetta Gaggio STUDENT_PER

Subjects by relevance
  1. Technology
  2. Memristors
  3. Data security
  4. Change

Extracted key phrases
  1. Volatile Memory Technology
  2. Ultralow Power Non
  3. Layered active layer
  4. Excellent active layer
  5. Thin Oxides
  6. Volatile memory
  7. Thin active region
  8. New high
  9. Datum centric technology
  10. Novel active
  11. Future potential use case
  12. Overall power usage
  13. Hungry datum centre
  14. New phenomenon
  15. Oxide material

Related Pages

UKRI project entry

UK Project Locations