ALEGRO: Atomic Layer Deposition and Etching for GaN Power Device Applications

Find Similar History 34 Claim Ownership Request Data Change Add Favourite

Title
ALEGRO: Atomic Layer Deposition and Etching for GaN Power Device Applications

CoPED ID
997daa26-310e-493f-8070-848e92581094

Status
Closed


Value
£532,240

Start Date
Aug. 31, 2017

End Date
Nov. 30, 2018

Description

More Like This


Electric cars and electric power delivery need efficient electrical switching devices. Semiconductor devices can do this, but also waste some energy when switching. This project plans to demonstrate high voltage switching devices using gallium nitride (GaN), the most significant semiconductor material after silicon, in a novel device format which can operate more efficiently and switch faster than the current device hybrids based on compound semiconductors combined with silicon. Making such devices will require almost atomic precision in etching and depositing layers. The project will further develop atomic layer etching (ALE) and atomic layer deposition (ALD) tools and processes ready for the manufacture of such devices. Oxford Instruments brings its experience as a process tool manufacturer for plasma-enhanced ALD, and its recent innovation in ALE, and will develop these tools and processes. The University of Glasgow will use its expertise in device design and manufacture to demonstrate a process flow for device manufacture.

Mike Cooke PM_PER

Subjects by relevance
  1. Semiconductors
  2. Atomic layer deposition
  3. Semiconductor technology
  4. Switching devices
  5. Electronics
  6. Thin films
  7. Devices
  8. Electrical engineering
  9. Electrical devices

Extracted key phrases
  1. GaN Power Device Applications
  2. Efficient electrical switching device
  3. Atomic Layer Deposition
  4. Semiconductor device
  5. Device manufacture
  6. Novel device format
  7. Current device hybrid
  8. Electric power delivery
  9. Device design
  10. Electric car
  11. Process tool manufacturer
  12. ALEGRO
  13. Significant semiconductor material
  14. Atomic layer
  15. Etching

Related Pages

UKRI project entry

UK Project Locations